Characteristics of Hafnium Silicate Films Deposited on Si by Atomic Layer Deposition Process
소개글Author: Lee Jung-Chan, Kim Kwang-Sook, Jeong Seok-Won, Roh Yonghan
Organization: Lee Jung-Chan; Kim Kwang-Sook; Jeong Seok-Won; Roh Yonghan
Publish: Transactions on Electrical and Electronic Materials Volume 12, Issue3, p127~130, 25 June 2011