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• Dry Etching Characteristics of Zinc Oxide Thin Films in Cl2-Based Plasma
• Dry Etching of ITO Thin Films by the Addition of Gases in Cl2 BCl3 Inductivity Coupled Plasma
• The Dry Etching Properties of ZnO Thin Film in Cl2 BCl3 Ar Plasma
• Etching Characteristics of HfAlO3Thin Films Using an Cl2 BCl3 Ar Inductively Coupled Plasma
• Effects of positive and negative stretching on the structure and properties of polyacrylonitrile fib