The Use of Inductively Coupled CF4 Ar Plasma to Improve the Etch Rate of ZrO2 Thin Films
소개글Author: Kim Han-Soo, Woo Jong-Chang, Joo Young-Hee, Kim Chang-Il
Organization: Kim Han-Soo; Woo Jong-Chang; Joo Young-Hee; Kim Chang-Il
Publish: Transactions on Electrical and Electronic Materials Volume 14, Issue1, p12~15, 25 Feb 2013
