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• 아크 플라즈마를 이용한 과불화합물 처리공정에서 반응가스에 의한 효과
• The Use of Inductively Coupled CF4 Ar Plasma to Improve the Etch Rate of ZrO2 Thin Films
• The Dry Etching of TiN Thin Films Using Inductively Coupled CF4 Ar Plasma
• The Dry Etching Characteristics of TiO2 Thin Films in N2 CF4 Ar Plasma
• Conducting and interface characterization of carbonate-type organic electrolytes containing EMImBF4